Out on the line, you know how it goes: a half-degree drift in soft bake is enough to knock critical dimension control right out of spec. That’s exactly the reality the DNS (Screen) wafer dryer lamp was built for. It holds wafer-level thermal uniformity within ±0.1°C across the chuck, so your photoresist bake profiles stay locked in—shot to shot, lot to lot.
What’s under the hood, technically
The lamp uses a short-wave infrared source inside a quartz envelope, tuned to match the absorption of the photoresist stacks we run. Response is sub-second, and temperature repeatability holds within 1°C over 5,000+ hours, with less than 5% output drop. The module is built for cleanroom Class 1–100, with a particle-controlled path and zero particle generation right at the heating point. Output is calibrated to deliver a repeatable thermal budget, and it interfaces cleanly with standard Screen dryer platforms.
Why it plays in lithography support
In lithography support, the lamp steadies both soft bake and hard bake, cutting down line-width excursions and keeping rework off the board. Thermal ramp control shortens cycle time without compromising film quality, and energy use stays lean because the heating is fast and targeted. It’s engineered for 24/7 operation with no unplanned downtime, and the design cuts back on consumable changes—keeping the fab moving.
What you need to keep straight on install and run
Installation comes down to precise alignment to the dryer optics and chuck, and you have to keep the lamp within its rated voltage window to preserve uniformity. There’s a brief warm-up, and you’ll want periodic intensity verification to maintain that ±0.1°C uniformity spec. Match the lamp to the specific dryer model, and your process window stays where you set it.